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Wholesale 40L 50L 150bar Oxygen Gas Cylinder Tank High Purity 5n 99.999% Oxygen O2 Gas
Overview Product Description ISO/DOT/TPED Certified 40L High Pressure Seamless Gas Cylinder / Carbon Monoxide/ Oxygen / ;
Overview
High purity oxygen gas is mainly used for thermal oxidation, diffusion, chemical vapor deposition, plasma etching and other processes of semiconductor devices. It can also be used for the manufacture of optical fiber and color picture tube and as standard gas, correction gas and zero gas. It is used as an oxidation source and a reagent to produce high-purity water. For MOS field effect devices, the oxide layer must be quite dense. The dry oxidation with high-purity oxygen can meet the production requirements with compact structure, less positive charge and high voltage withstand. Mixed with carbon tetrafluoride, it can be used for plasma etching.
Qingdao Forterra Gas Co.,Ltd. is one of leading manufactures of Industrial Gas( Argon, Nitrogen, Acetylene,Helium,H2,O2,CO2,N2O ...). Our Gas and Cylinders have been exported to Africa, South America, Middle East, South Asia, Russia, Spain, Brazil, Australia..etc.
The following gases are the regular export gases currently, please kindly check for your kind reference:
Basic Info.
| Model NO. | 50L 200bars |
| Melting Point | -218.4 |
| Cylinder Color | Green or Customized Color |
| Appearance | Colorless |
| Brand | Forterra |
| Boiling Point | -183 |
| Working Pressure | 150bar/200bar |
| Testing Pressure | 250bar/300bar |
| Cylinder Standard | ISO9809-3 or ISO9809-1 |
| Product Name | High Purity Oxygen Gas |
| Transport Package | Gas Cylinder |
| Specification | 50L 200bar |
| Trademark | FORTERRA |
| Origin | China |
| HS Code | 7311009000 |
| Production Capacity | 5000000/Year |
Product Description
Product Description
ISO/DOT/TPED Certified 40L High Pressure Seamless Gas Cylinder / Carbon Monoxide/ Oxygen / Argon / CO2 Cylinder
OXYGEN GASHigh purity oxygen gas is mainly used for thermal oxidation, diffusion, chemical vapor deposition, plasma etching and other processes of semiconductor devices. It can also be used for the manufacture of optical fiber and color picture tube and as standard gas, correction gas and zero gas. It is used as an oxidation source and a reagent to produce high-purity water. For MOS field effect devices, the oxide layer must be quite dense. The dry oxidation with high-purity oxygen can meet the production requirements with compact structure, less positive charge and high voltage withstand. Mixed with carbon tetrafluoride, it can be used for plasma etching.
| Product name | Steel Gas Cylinder for Oxygen |
| Working pressure | 150Bar |
| Water Capacity | 50L |
| Wall Thickness | 5.8mm |
| Outside Diameter | 229mm |
| Weight(without valve) | 51kg |
| Product quality certification | CE |
| Size | 219mm*1330mm |
| standard | ISO9809 |
| Useage | oxygen, co2 |
| Kind of power | Hydraulic |
The following gases are the regular export gases currently, please kindly check for your kind reference:
| ITEM | NAME | CYLINDER SIZE | WORKING PRESSURE | GAS PURITY |
| CYLINDER STANDARD ISO9809 | ||||
| 1 | Argon | 20L/30L/40L/50L | 150BAR/200BAR | 99.99% ~ 99.999% |
| 2 | Oxygen | 10L/20L/30L/40L/50L | 150BAR/200BAR | 99.9% ~ 99.999% |
| 3 | CO2(Food) | 10L/15L/40L/50L | 150BAR/200BAR | 99.9% ~ 99.99% |
| 4 | CO2(Industrial) | 40L/50L | 150BAR/200BAR | 99.9% ~ 99.99% |
| 5 | Nitrogen | 20L/30L/40L/50L | 150BAR/200BAR | 99.99% ~ 99.999% |
| 6 | Helium | 20L/30L/40L/50L | 150BAR/200BAR | 99.99% ~ 99.999% |
| 7 | N2O(laughing gas) | 10L/20L/30L/40L/50L | 150BAR/200BAR | 99.9% ~ 99.99% |
| 8 | Argon Mixed Gas | 40L/50L | 150BAR/200BAR | - |
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Product Parameters
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